Temperature dependence of the response of ultra fast silicon detectors

R. Mulargia, R. Arcidiacono, A. Bellora, M. Boscardin, N. Cartiglia, F. Cenna, R. Cirio, G. F.Dalla Betta, S. Durando, A. Fadavi, M. Ferrero, Z. Galloway, B. Gruey, P. Freeman, G. Kramberger, I. Mandic, V. Monaco, M. Obertino, L. Pancheri, G. PaternosterF. Ravera, R. Sacchi, H. F.W. Sadrozinski, A. Seiden, V. Sola, N. Spencer, A. Staiano, M. Wilder, N. Woods, A. Zatserklyaniy

Risultato della ricerca: Contributo su rivistaArticolo in rivistapeer review

Abstract

The Ultra Fast Silicon Detectors (UFSD) are a novel concept of silicon detectors based on the Low Gain Avalanche Diode (LGAD) technology, which are able to obtain time resolution of the order of few tens of picoseconds. First prototypes with different geometries (pads/pixels/strips), thickness (300 and 50 μm) and gain (between 5 and 20) have been recently designed and manufactured by CNM (Centro Nacional de Microelectrónica, Barcelona) and FBK (Fondazione Bruno Kessler, Trento). Several measurements on these devices have been performed in laboratory and in beam test and a dependence of the gain on the temperature has been observed. Some of the first measurements will be shown (leakage current, breakdown voltage, gain and time resolution on the 300 μm from FBK and gain on the 50 μm-thick sensor from CNM) and a comparison with the theoretically predicted trend will be discussed.

Lingua originaleInglese
Numero di articoloC12013
RivistaJournal of Instrumentation
Volume11
Numero di pubblicazione12
DOI
Stato di pubblicazionePubblicato - 7 dic 2016

Fingerprint

Entra nei temi di ricerca di 'Temperature dependence of the response of ultra fast silicon detectors'. Insieme formano una fingerprint unica.

Cita questo