Surface engineering with functional random copolymers for nanolithographic applications

Katia Sparnacci, Diego Antonioli, Valentina Gianotti, Federico Ferrarese Lupi, Tommaso Jacopo Giammaria, Gabriele Seguini, Michele Perego, Michele Laus

Risultato della ricerca: Capitolo in libro/report/atti di convegnoContributo a conferenzapeer review

Abstract

Hydroxyl-terminated P(S-r-MMA) random copolymers with molecular weight ranging from 1.7 to 69 kg/mol and a styrene unit fraction of 61% were grafted onto a silicon oxide surface and subsequently used to study the orientation of domains with respect to the substrate, in cylinder-forming PS-b-PMMA block copolymer thin films. When the thickness (H) of the grafted layer is greater than 5-6 nm, a perpendicular orientation is always observed because of the efficient decoupling of the BCP film from the polar SiO2 surface. Conversely, if H is less than 5 nm, the critical thickness of the grafted layer, which allows the neutralization of the substrate and promotion of the perpendicular orientation of the nanodomains in the BCP film, is found to depend on the Mn of the RCP. In particular, when Mn = 1700, a 2.0 nm thick grafted layer is sufficient to promote the perpendicular orientation of the PMMA cylinders in the PS-b-PMMA BCP film.

Lingua originaleInglese
Titolo della pubblicazione ospiteVIII International Conference on "Times of Polymers and Composites"
Sottotitolo della pubblicazione ospiteFrom Aerospace to Nanotechnology
EditorAlberto D'Amore, Luigi Grassia, Domenico Acierno
EditoreAmerican Institute of Physics Inc.
ISBN (elettronico)9780735413900
DOI
Stato di pubblicazionePubblicato - 18 mag 2016
Evento8th International Conference on Times of Polymers and Composites: From Aerospace to Nanotechnology - Ischia, Naples, Italy
Durata: 19 giu 201623 giu 2016

Serie di pubblicazioni

NomeAIP Conference Proceedings
Volume1736
ISSN (stampa)0094-243X
ISSN (elettronico)1551-7616

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???event.eventtypes.event.conference???8th International Conference on Times of Polymers and Composites: From Aerospace to Nanotechnology
Paese/TerritorioItaly
CittàIschia, Naples
Periodo19/06/1623/06/16

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