Abstract
The photodecomposition of adsorbed ethanoic acid was studied on a number of pure and mixed insulator and semiconductor systems having a wide range of acid-base features. MgO appeared to be much more active than any other oxide when oxygen was not present in the reactant mixture. On the basis of infrared, U.V.-Vis. reflectance and photoluminescence data it is suggested that in this case the surface hydroxy-groups which are known to absorb at wavelengths longer than 300 nm are involved in the photodecomposition process.
| Lingua originale | Inglese |
|---|---|
| pagine (da-a) | 643-652 |
| Numero di pagine | 10 |
| Rivista | Studies in Surface Science and Catalysis |
| Volume | 48 |
| Numero di pubblicazione | C |
| DOI | |
| Stato di pubblicazione | Pubblicato - 1 gen 1989 |
| Pubblicato esternamente | Sì |
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