Abstract
Photocatalytic lithography is proved for the realization of micropatterned polymer brushes. Initiator-functionalized titanium dioxide or silicon surfaces are respectively exposed directly to near-UV light through a photomask (direct approach) or through a transparent photoactive TiO2 film (remote approach). Initiator patterns are then amplified as polymer brushes with SI-ATRP. Features down to 10 μm could be obtained using simple equipment. The process is intrinsically parallel, has high throughput and scalable to wafer size, making it powerful for microfabrication purposes.
Lingua originale | Inglese |
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pagine (da-a) | 7313-7316 |
Numero di pagine | 4 |
Rivista | Chemical Communications |
Volume | 51 |
Numero di pubblicazione | 34 |
DOI | |
Stato di pubblicazione | Pubblicato - 30 apr 2015 |