Macro and quasi-mesoporous silicon by self-assembling and metal assisted etching

L. Boarino, E. Enrico, N. De Leo, F. Celegato, P. Tiberto, Katia Sparnacci, M. Laus

Risultato della ricerca: Contributo su rivistaArticolo in rivistapeer review

Abstract

The combination of two recent techniques developed in the last years demonstrates the possibility to obtain regular and semi-ordered macro and mesopores on any type of silicon substrates and with holes diameter ranging from 800 to 60nm and less. Self-assembling of polystyrene nanospheres (PSNS) is obtained by floating technique, then the 2D crystal is lifted on a silicon substrate with a 30nm silver thin film deposited by thermal evaporation or sputtering. The nanospheres are then reduced in diameter by reactive ion etching (RIE) in oxygen plasma, then the samples are exposed to Ar ions sputter-etching (SE) for thin film structuration. At this point of the process the polystyrene nanosphere mask is removed and a metal assisted etching (MAE) of few minutes is performed. Ordered and regular pores of diameters ranging from 500 to 60nm have been obtained. Macropores (450nm) obtained by self-assembly nanolithography and metal assisted etching.
Lingua originaleInglese
pagine (da-a)1403-1406
Numero di pagine4
RivistaPhysica Status Solidi (A) Applications and Materials Science
Volume208
Numero di pubblicazione6
DOI
Stato di pubblicazionePubblicato - giu 2011

Fingerprint

Entra nei temi di ricerca di 'Macro and quasi-mesoporous silicon by self-assembling and metal assisted etching'. Insieme formano una fingerprint unica.

Cita questo