Hierarchical Self-Assembly of Halogen-Bonded Block Copolymer Complexes into Upright Cylindrical Domains

R. Milani, N. Houbenov, F. Fernandez-Palacio, G. Cavallo, A. Luzio, J. Haataja, G. Giancane, MARCO SACCONE, A. Priimagi, P. Metrangolo, O. Ikkala

Risultato della ricerca: Contributo su rivistaArticolo in rivistapeer review

Abstract

Self-assembly of block copolymers into well-defined, ordered arrangements of chemically distinct domains is a reliable strategy for preparing tailored nanostructures. Microphase separation results from the system, minimizing repulsive interactions between dissimilar blocks and maximizing attractive interactions between similar blocks. Supramolecular methods have also achieved this separation by introducing small-molecule additives binding specifically to one block by noncovalent interactions. Here, we use halogen bonding as a supramolecular tool that directs the hierarchical self-assembly of low-molecular-weight perfluorinated molecules and diblock copolymers. Microphase separation results in a lamellar-within-cylindrical arrangement and promotes upright cylindrical alignment in films upon rapid casting and without further annealing. Such cylindrical domains with internal lamellar self-assemblies can be cleaved by solvent treatment of bulk films, resulting in separated and segmented cylindrical micelles stabilized by halogen-bond-based supramolecular crosslinks. These features, alongside the reversible nature of halogen bonding, provide a robust modular approach for nanofabrication
Lingua originaleInglese
pagine (da-a)417-426
Numero di pagine10
RivistaChem
Volume2
Numero di pubblicazione3
DOI
Stato di pubblicazionePubblicato - 2017

Keywords

  • Block copolymers
  • halogen bond
  • hierarchical self-assembly
  • nanofabrication
  • supramolecular complexes

Fingerprint

Entra nei temi di ricerca di 'Hierarchical Self-Assembly of Halogen-Bonded Block Copolymer Complexes into Upright Cylindrical Domains'. Insieme formano una fingerprint unica.

Cita questo